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Zirconium disilicide(ZrSi2)

Zirconium disilicide(ZrSi2)

  • Classification:Silicide series
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  • Date of issue:2024-12-05 20:29:55
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Zirconium disilicide manufacturers

Product Name: Zirconium Disilicide (ZrSi2) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: high hardness, high melting point, high conductivity, high thermal conductivity, and excellent thermal shock resistance 
Usage: High tech fields such as information and communication, aerospace, military, coatings, inks, rubber and plastic, ceramics, textiles, cosmetics, pharmaceuticals, batteries, environmental protection, solar energy, etc

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium disilicide manufacturers

Zirconium silicide 
Chemical formula: ZrSi2 
Appearance: Grey square crystalline powder 
Density (g/mL, 25 ℃): 4.88 
Melting point (oC): 1620 
Lattice constants: a=0.372nm, b=1.476nm, c=0.367nm. 
Microhardness (kg/mm2): 1063 
Heat of generation (kJ/mol): 62.8 
Property: Zirconium silicide or zirconium disilicide, chemical formula ZrSi2, is a steel gray diamond shaped glossy crystal with a relative density of 4.8822. Zirconium silicide is insoluble in water, inorganic acids, and aqua regia, but soluble in hydrofluoric acid. Zirconium silicide is a shiny crystal in the steel gray rhombohedral system, with a relative density of 4.8822.   
Preparation process of zirconium silicide: 
1. Using zirconium metal and silicon powder as raw materials, the zirconium metal is crushed and thoroughly mixed with silicon powder. The mixture is then placed in a graphite furnace and heated to 900-1000 ℃ for pre reaction. Hydrogen gas is then introduced and heated to around 1200 ℃ for reaction, resulting in zirconium silicide. 
2. Using the direct method, zirconium silicide is prepared from zirconium metal and silicon powder as raw materials. The reaction equation is as follows: first, the zirconium metal is crushed, then thoroughly mixed with silicon powder. The mixture is placed in a graphite furnace, heated to 900-1000 ℃ for pre reaction, and then hydrogen gas is introduced, and then heated to around 1200 ℃ for homogenization reaction to obtain zirconium silicide. 
3. A method for preparing zirconium silicide nanomaterials, comprising the following steps: (1) adding 5mmol of zirconium dioxide, 5mmol of silicon powder, and 50mmol of metallic lithium into a 20ml stainless steel high-pressure vessel and sealing it, then placing the high-pressure vessel into an electric furnace capable of programmed heating, setting the heating rate of the electric furnace to 10 ℃ per minute, heating the electric furnace to 600 ℃, maintaining the reaction for 40 hours after heating, naturally cooling to room temperature after the reaction, and then opening the high-pressure vessel to remove the product (black deposit in Chemicalbook); (2) Wash the reaction product with distilled water once, then wash it with dilute hydrochloric acid and anhydrous ethanol once each. Filter the washed product and dry it in a vacuum drying oven at 60 ℃ for 4 hours to obtain zirconium silicide nanomaterials. Based on the mass of the prepared zirconium silicide nanomaterials and the mass of the raw material zirconium dioxide used, the yield of zirconium silicide is 85%. The above reaction process is as follows: ZrO2+Si+4Li=ZrSi+2LiO 
Zirconium silicide uses: 
ZrSi2 is a zirconium silicon intermetallic compound, which is a ceramic material with high hardness, high melting point, high conductivity, high thermal conductivity, and good high-temperature thermal shock resistance. Ultra high temperature materials used for manufacturing thermal protection components should have excellent properties such as high strength, high temperature resistance, oxidation resistance, and thermal shock resistance. The main applications include refractory metals and their alloys, C-C composite materials, C-SiC composite materials, and ceramic based composite materials. The mass fraction of zirconium disilicide is 10-15%. Adding this mass fraction of zirconium disilicide to ceramic matrix composites can significantly reduce the sintering temperature of material preparation. 
Zirconium silicide can be used as a lubricating material, wear-resistant material, semiconductor thin film, electronic material, and ceramic material. 
3. Deoxidizer. During the steelmaking process, oxygen is removed from the molten steel, and some ferroalloys can also remove other impurities such as sulfur and nitrogen from the steel. 
4. Alloy additives. According to the composition requirements of the steel grade, alloy elements are added to the steel to improve its properties. 
Zirconium silicide, as a zirconium silicon intermetallic compound, is a type of high-temperature ceramic material with high hardness, high melting point, high conductivity, high thermal conductivity, and excellent thermal shock resistance. Considering the superior physical and chemical properties of zirconium silicon intermetallic compounds, it is a structural material or new engineering material that can be applied to high-temperature corrosive media. 
5. Due to the excellent physical and chemical properties of silicon zirconium intermetallic compounds, ZrSi2 is a structural material or new engineering material that can be used as a high-temperature corrosion medium. 
Research on the Elasticity and Anisotropy of Zirconium Silicide The compound formed between metal and silicon is metal silicide, which can be divided into two categories: 
1. Difficult to melt metal silicides, referring to periodic table IVB, VB, VIB Silicides of group elements, such as titanium silicide, zirconium silicide, tantalum silicide, tungsten silicide, etc., as well as precious and near precious metal silicides, silicides targets, platinum silicides, cobalt silicides, etc., are relatively hard substances with metallic luster, high conductivity, positive resistance humidity coefficient, and magnetism in most cases. Refractory metal silicides have high melting points, hardness, and compressive strength, high temperature creep strength, medium density and tensile strength, and good temperature mechanical properties. The reaction between metals and silicon reduces the activity of metals, so the chemical stability of silicides is quite good. Refractory metal silicides with high silicon content are resistant to room temperature and high temperature. Both corrosiveness and oxidation resistance are good, but the disadvantages of metal silicides are: they are brittle at room temperature and have low impact toughness, Insufficient resistance to thermal shock. The physical and chemical properties of metal silicides make them versatile. Firstly, silicides have great potential as high-temperature structural materials in aviation, aerospace, and chemical industries. They have been widely studied and applied as high-temperature anti-oxidation coatings, magnetic materials, integrated circuit electrode films, and other functional materials. For example, Fe2Si ordered alloys have excellent soft magnetic properties and are widely used as magnetic head materials for audio, video, and card readers; Silicides have been introduced into V2Si, CoSi2, and Mo2Si. Due to their excellent conductivity, V2Si is a discovered superconducting A15 phase with a critical transition temperature of 17.1K; MoSi2 is widely used as an electric heating element in high-temperature electric furnaces and as a high-temperature anti-oxidation coating in aerospace due to its excellent conductivity and oxidation resistance. Similarly, metal silicides play a very important role in electronic device manufacturing. Due to the lower resistance of silicides compared to polycrystalline silicon, and the atomically clean interface between silicides and silicon substrates, compatibility is good. In the manufacturing industry of microelectronics, they are widely used as Schottky barriers and interconnect materials.

 

 

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