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Chromium disilicide(CrSi2)

Chromium disilicide(CrSi2)

  • Classification:Silicide series
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  • Date of issue:2024-12-06 10:05:00
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chromium disilicide prices

Product Name: Chromium Disilicide (CrSi2) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: Good mechanical performance and high temperature stability, high electrical resistivity, low temperature coefficient of resistance 
Usage: High tech fields such as research laboratories, information and communication, aerospace, military, coatings, inks, rubber and plastic, ceramics, textiles, cosmetics, pharmaceuticals, batteries, environmental protection, solar energy, etc

chromium disilicide prices

chromium disilicide prices

chromium disilicide applications

chromium disilicide applications

chromium disilicide applicationschromium disilicide applications

chromium disilicide applications

中文名:硅化铬
English name: Chromium silica 
CAS:12018-09-6 
Density (g/mL, 25/4 ℃): 5.5 
Melting point: 1490 º C 
Molecular formula: CrSi2 
Molecular weight: 108.16700 
Accurate quality: 107.89400 
Appearance: Silver to black powder, odorless, insoluble in water, soluble in hydrochloric acid and hydrofluoric acid. 
Stability: Will not decompose when used and stored according to specifications. Chromium silicide is a gray tetragonal prismatic crystal that is insoluble in water, sulfuric acid, and nitric acid, but soluble in hydrochloric acid and hydrofluoric acid. Stable in air at room temperature; At 100 ℃, the surface is oxidized; At 00 ℃, 4Chemicalbook reacts violently with chlorine to produce chromium trichloride and silicon tetrachloride. 
Performance: Chromium silicide thin film has high resistivity and low temperature coefficient of resistance. Gray cubic crystal, hexagonal crystal system, a=04422nm, c=06351nm, melting point close to 1550 ℃, high resistivity of chromium silicide film, low temperature coefficient of resistance. Chromium silicide thin films have high electrical resistivity and low temperature coefficient of resistance. 
Preparation process: 
After mixing silicon powder with chromium powder, it can be calcined in hydrogen gas at 900-1100 ℃ and cooled. Alternatively, a mixture of chromium powder and silicon powder can be uniformly mixed with a mixture of silicon dioxide powder and silicon powder, and then calcined in a hydrogen gas stream. The volatile SiO formed by SiO2 and Si powder can escape along with Na and K in the raw material to obtain CrSi2. 
2. Chromium and silicon powder can be melted or sintered together in vacuum or under hydrogen protection to obtain Cr3Si (cubic crystal) with a melting point of about 1710 ℃, Cr5Si3 (tetragonal crystal, melting point of about 1600 ℃), CrSi (cubic crystal, melting point of about 1600 ℃), CrSi2, and Cr3Si2.

chromium disilicide applications




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