Product Name: Hafnium Nitride (HfN) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: High temperature resistance, corrosion resistance, wear resistance, thermal shock resistance, low density and high hardness, excellent heat resistance and mechanical properties 
Application: Aerospace, energy, electronic devices and other fields

hafnium nitride HfN 
Property: Grey powder, cubic crystal structure 
Melting point 3310 ℃ 
Microhardness 16GPa 
Relative molecular weight: 192.50 
Density/(g/cm3): 10.85/cm3 
Specific heat capacity/[J/(kg. K)]: 209.2 
Thermal conductivity/[W/(m.K)]: 11.715 
Quite stable, but susceptible to corrosion by aqua regia, concentrated sulfuric acid, and hydrofluoric acid. High purity, small particle size, uniform distribution, large specific surface area, high surface activity, gray powder, cubic crystal structure. Microhardness of 16GPa. Produced directly by the reaction of hafnium and nitrogen at 900 ℃, or by the reaction of hafnium halides with ammonia or a mixture of nitrogen and hydrogen gas. It is an important component of hafnium alloy, an important refractory compound. 
Product application: 
Hafnium nitride has excellent mechanical, electrical, optical, high temperature resistance, and corrosion resistance properties, and has very important applications in mechanical manufacturing and microelectronics; Nano hafnium nitride can be widely used in various fields such as semiconductors, optoelectronics, and mechanical processing; Due to the integration of various excellent mechanical, thermal, optical, and corrosion-resistant properties, nano hafnium nitride film is expected to become an efficient optical window anti reflective protective coating material, which can be applied to key optical devices in aerospace. HfN is a new type of hard material with high melting point, high hardness, wear resistance, and oxidation resistance. It can be used as a protective layer in the fields of technology and decoration, as well as an anti-wear outer film for cutting tools, chemical inert films, and high-temperature resistant protective films.