Product Name: Hafnium Nitride (HfN) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: High temperature resistance, corrosion resistance, wear resistance, thermal shock resistance, low density and high hardness, excellent heat resistance and mechanical properties 
Application: Aerospace, energy, electronic devices and other fields

hafnium nitride

chemical formula: HfN

Appearance: earthy yellow powder

Melting point: 3310 ℃

Microhardness: 16GPa

Relative molecular weight: 192.50

Density/(g/cm3): 10.85/cm3

Specific heat capacity/[J/(kg. K)]: 209.2

Thermal conductivity/[W/(m.K)]: 11.715

Property: Quite stable, but susceptible to corrosion by aqua regia, concentrated sulfuric acid, and hydrofluoric acid.

1. High hardness: Hafnium nitride has a very high hardness, even higher than steel and tungsten.

2. High melting point: The melting point of hafnium nitride is very high, about 3310 ℃.

3. High conductivity: Hafnium nitride is a good conductor that can maintain good conductivity under high temperature and high pressure conditions.

4. Corrosion resistance: Hafnium nitride exhibits good stability in high temperatures and oxidizing atmospheres, and is not easily corroded.

5. High temperature stability: Hafnium nitride can also maintain stability at high temperatures, so it is widely used in the preparation of high-temperature materials.

6. Wear resistance: Hafnium nitride has excellent wear resistance at high temperatures and pressures, and is therefore widely used in the preparation of cutting tools and abrasives.

7. Chemical stability: Hafnium nitride is very stable in many chemical environments, so it can be used in chemical reactors and other applications that require stable materials.

Preparation process:

1. CVD method

CVD method is a commonly used method for preparing hafnium nitride, which involves reacting hafnium containing raw materials and nitrogen-containing raw materials at high temperatures to generate hafnium nitride thin films.

2. PVD method

PVD method is a vacuum coating technology that can evaporate hafnium and nitrogen elements at high temperatures and deposit them on a substrate to form hafnium nitride thin films.

3. Hot pressing sintering method

After mixing hafnium and nitrogen-containing powders, sintering is carried out at high temperature and high pressure to generate hafnium nitride blocks.

Product application:

1. Electronic field

Hafnium nitride is an excellent electronic material that can be used to manufacture high-speed electronic devices and integrated circuits. Compared to traditional silicon materials, hafnium nitride has higher electron mobility and high temperature resistance, and can operate under high temperature and high frequency conditions. Therefore, hafnium nitride has a wide range of applications in high-temperature superconducting materials, microwave devices, optoelectronic devices, and other fields.

2. Aerospace field

Hafnium nitride has excellent wear resistance, corrosion resistance, and high temperature performance, and can be used to manufacture components for aircraft engines. Under high temperature and pressure conditions, hafnium nitride can maintain stable performance, reduce wear and corrosion, and improve engine efficiency and lifespan.

3. Wear resistant materials

HfN is a new type of hard material with high melting point, high hardness, wear resistance, and oxidation resistance. It can be used as a protective layer in the fields of technology and decoration, as well as an anti-wear outer film for cutting tools, a chemical inert film, and a high-temperature resistant protective film.

Storage method: This product should be sealed and stored in a dry and cool environment. It should not be exposed to air for a long time to prevent moisture from causing aggregation, affecting dispersion performance and usage effect. In addition, it should be avoided from heavy pressure and not in contact with oxidants. It should be transported as ordinary goods.