Product Name: Titanium Trisilicide (Ti5Si3) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: high melting point, low density, good high-temperature stability, oxidation resistance 
Purpose: Optical coating 

Name: Pentatitanium trisilicide 

Molecular formula: Ti5si3 

Cas：12067-57-1 

Appearance: Grey black 

Melting point: 2130 ℃ 

Boiling point: 2130 ℃ 

Density: 4.39g/cm3 

Molecular weight: 323.59 

Application: Titanium silicide is widely used in the manufacturing of gates, source/drain electrodes, interconnects, and ohmic contacts in metal oxide semiconductors (MOS), metal oxide semiconductor field-effect transistors (MOSFET), and dynamic random access memory (DRAM). 

Performance and use of pentatitanium trisilicide: 

Ti5Si3 has a high melting point (2130 ℃), low density (4.65g/cm3), and excellent high-temperature properties such as high temperature hardness, good high-temperature stability, and oxidation resistance. It has the potential to be used as a high-temperature structural material above 1300 ℃. The melting point of Ti5Si3 is close to or even higher than that of high-temperature structural ceramics, but its density is much lower than some high-temperature structural ceramics and high-temperature alloys, comparable to titanium alloys, and has the potential for use at high temperatures. In addition, due to its low resistance and thermal resistance, Ti5Si3 also has the potential to be used in electrical connection structures and diffusion barrier layers.